CONTROL OF THE PROPERTIES OF THIN-FILM SYSTEMS WITH 
THE USE OF PULSED PHOTON TREATMENT

V. A. Pilippenko, V. N. Ponomar', and V. A. Gorushko

UDC 621.3.049.77.621.373.826

We have developed a radically new technological process 
of making very large-scale integrated circuits, which has no analogs 
and is based on the use of fast heat treatments for forming gettering 
layers, silicon oxidation, annealing of ion-doped layers, fusion of 
phosphoro- and borophosphorosilicate glasses, forming silicides, and 
increasing the thermostability of aluminum metallization.

Unitary Enterprise "Belmikrosistemy," Scientific-Production 
Association "Integral," Minsk, Belarus. Translated from Inzhenerno-Fizicheskii 
Zhurnal, Vol. 76, No. 4, pp. 95-98, July-August, 2003. Original 
article submitted October 10, 2002.