KINETICS OF PHYSICAL AND CHEMICAL
DEPOSITION OF A SUBSTANCE FROM
THE GAS PHASE IN CHANNELS 
V. V. Levdanskiia and J. Smolikb

UDC 533.7:536.422.4

Based on the molecular-kinetic approach, the processes 
of physical and chemical deposition of a substance from the gas phase 
on the interior surface of a channel are investigated. The problem 
of deposition of films which are uniform in thickness is discussed.

aAcademic Scientific Complex "A. V. Luikov Heat 
and Mass Transfer Institute," National Academy of Sciences of Belarus, 
Minsk, Belarus; email: vlev5@yahoo.com; 
bInstitute of Chemical Process Fundamentals, 
Academy of Sciences of the Czech Republic, Prague, Czech Republic; 
Translated from Inzhenerno-Fizicheskii Zhurnal, Vol. 74, No. 5, 
pp. 142-145, September-October, 2001. 
Original article submitted February 20, 2001.


JEPTER7492020012
JEPTER749202