SYNTHESIS OF THIN FILMS WITH CONTROLLED ABSORPTION USING A JET HIGH-FREQUENCY INDUCTION PLASMATRON
I. Sh. Abdullina, R. T. Galyautdinovb, and N. F. Kashapova UDC 539.23 The authors investigate SiOx and TiOx (0 < x < 2) thin-film coatings with controlled absorption which are produced using a jet high-frequency plasma under conditions of dynamic vacuum. aKazan State Technological University, Kazan, Russia; bScientific-Research Institute of Pump Manufacturing Engineering, Kazan, Russia; email: raf7g@mail.ru. Translated from Inzhenerno-Fizicheskii Zhurnal, Vol. 74, No. 5, pp. 104-107, September-October, 2001. Original article submitted September 20, 2000; revision submitted January 24, 2001. JEPTER7492020015 JEPTER749205