MATHEMATICAL MODELING OF SiO2 NANOPARTICLE CONDENSATION UNDER LOW-TEMPERATURE PLASMA CONDITIONS

A model has been proposed that describes the processes of nucleation and growth of SiO₂ nanoparticles from the gas phase formed in a plasma-chemical arc-discharge reactor. The value of the median diameter at a temperature T > 1500 K is determined by the rate of nucleation, deposition of molecules onto the particles formed, and by the rate of coagulation of formed particles. The main processes determining the change in the median diameter at temperatures 1000 < T < 1500 K are precipitation and coagulation. At a low temperature, T < 1000 K, a change in the median diameter occurs due to the deposition of molecules from the gas phase on the formed particles
A model has been proposed that describes the processes of nucleation and growth of SiO₂ nanoparticles from the gas phase formed in a plasma-chemical arc-discharge reactor. The value of the median diameter at a temperature T > 1500 K is determined by the rate of nucleation, deposition of molecules onto the particles formed, and by the rate of coagulation of formed particles. The main processes determining the change in the median diameter at temperatures 1000 < T < 1500 K are precipitation and coagulation. At a low temperature, T < 1000 K, a change in the median diameter occurs due to the deposition of molecules from the gas phase on the formed particles
Author:  O. V. Matvienko, V. V. Shekhovtsov
Keywords:  silicon dioxide nanopowder, nucleation, condensation, coagulation, numerical simulation
Page:  625